HF Vapor Etch 

team with Qianru Jia (Sally) Shi group

The 1st trail - SiO2 with Graphene

The 2nd trail 

Xiaoyu find an unknown wafer from the library lab. He is not 100% sure the material on the wafer. He guesses that is SiO2.

2 hrs HF Vapor Etch: N2 flow 3, on knob, 120 C

1 hrs HF Vapor Etch: N2 flow 3, on knob, 120 C

The 3rd trail

04/06/2023

Xiaoyu Grows SiO2 at Gield Oxide Furnace. 8 hrs, Gate 1050, 260 nm

HF Vapor Etching: about 4 N2 flow, 120 C, the total etching is about 10 hrs.